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Extension of the impedance field method to the noise analysis of a semiconductor junction: Analytical approach
Gomila Lluch, Gabriel; Bulashenko, Oleg; Rubí Capaceti, José Miguel; Kochelap, V. A.(Viacheslav Aleksandrovich)
Universitat de Barcelona
We present an analytical procedure to perform the local noise analysis of a semiconductor junction when both the drift and diffusive parts of the current are important. The method takes into account space-inhomogeneous and hot-carriers conditions in the framework of the drift-diffusion model, and it can be effectively applied to the local noise analysis of different devices: n+nn+ diodes, Schottky barrier diodes, field-effect transistors, etc., operating under strongly inhomogeneous distributions of the electric field and charge concentration
-Semiconductors
-Soroll electrònic
-Díodes
-Transistors
-Camps elèctrics
-Microelectrònica
-Semiconductors
-Electronic noise
-Diodes
-Transistors
-Electric fields
-Microelectronics
(c) American Institute of Physics, 1998
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American Institute of Physics
         

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