Per accedir als documents amb el text complet, si us plau, seguiu el següent enllaç: http://hdl.handle.net/2445/98399
Títol:
|
Kelvin probe measurements of microcrystalline silicon on a nanometer scale using SFM
|
Autor/a:
|
Breymesser, A.; Schlosser, V.; Peiró, D.; Voz Sánchez, Cristóbal; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Summhammer, J.
|
Altres autors:
|
Universitat de Barcelona |
Abstract:
|
Work function measurements on cross-sectioned microcrystalline pin silicon solar cells deposited by Hot-Wire CVD are presented. The experiment is realized by combining a modified Kelvin probe experiment and a scanning force microscope. The measured surface potential revealed that the built-in electric drift field is weak in the middle of the compensated intrinsic layer. A graded donor distribution and a constant boron compensation have to be assumed within the intrinsic layer in order to obtain coincidence of the measurements and simulations. The microcrystalline p-silicon layer and the n-type transparent conducting oxide form a reverse polarized diode in series with the pin diode. |
Matèries:
|
-Silici -Deposició química en fase vapor -Cèl·lules solars -Silicon -Chemical vapor deposition -Solar cells |
Drets:
|
(c) Elsevier B.V., 2001
|
Tipus de document:
|
Article Article - Versió acceptada |
Publicat per:
|
Elsevier B.V.
|
Compartir:
|
|
Mostra el registre complet del document