Excimer laser induced deposition of copper from Cu(hfac)(TMVS)

Home | About RECERCAT | Contact

Català | Castellano

All of RECERCAT

By Communities &
Collections By Defense Date By Authors By Titles By Subject

This Collection

By Defense Date By Authors By Titles By Subject

Statistics

View Statistics All RECERCAT

My RECERCAT

Other repositories directory

RECERCAT Home > Universitat de Barcelona > Física Aplicada > Articles publicats en revistes (Física Aplicada) > View document

To access the full text documents, please follow this link: http://hdl.handle.net/2445/98759

Title:	Excimer laser induced deposition of copper from Cu(hfac)(TMVS)
Author:	Izquierdo, Ricardo; Bertomeu i Balagueró, Joan; Suys, Marc; Sacher, Edward; Meunier, Michel
Other authors:	Universitat de Barcelona
Abstract:	Copper films have been deposited on TiN and fluoropolymer substrates from the KrF excimer-laser-assisted decomposition of Cu(hfac)(TMVS). Using H2 as the carrier gas, very uniform, shiny metal-like films were deposited with grain size of 50 to 100 nm. XPS measurements show that the precursor is reduced to metallic copper, and that a Cu/C atomic ratio of up to 17 is obtained.
Subject(s):	-Coure -Làsers -Pel·lícules metàl·liques -Copper -Lasers -Metallic films
Rights:	(c) Elsevier B.V., 1995
Document type:	Article Article - Accepted version
Published by:	Elsevier B.V.
Share:

Show full item record

Related documents

Other documents of the same author

Analysis of bias stress on thin-film transistors obtained by Hot-Wire Chemical Vapour Deposition

Dosev, D.; Puigdollers i González, Joaquim; Orpella, Albert; Voz Sánchez, Cristóbal; Fonrodona Turon, Marta; Soler Vilamitjana, David; Marsal Garví, Lluís F. (Lluís Francesc); Pallarés Curto, Jordi; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Alcubilla González, Ramón

Surface passivation of crystalline silicon by Cat-CVD amorphous and nanocrystalline thin silicon films

Voz Sánchez, Cristóbal; Martin Garcia, Isidro; Orpella, Albert; Puigdollers i González, Joaquim; Vetter, M.; Alcubilla González, Ramón; Soler Vilamitjana, David; Fonrodona Turon, Marta; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi

Elaboració d'una base de dades per a l'autoformació i autoavaluació de coneixements i competències en estudis científics superiors

Canillas i Biosca, Adolf; Ferrater Martorell, Cèsar; Varela Fernández, Manuel, 1956-; Bertomeu i Balagueró, Joan; Pascual Miralles, Esther

Low temperature back-surface-field contacts deposited by Hot-wire CVD for heterojunction solar cells

Muñoz Ramos, David; Voz Sánchez, Cristóbal; Martin Garcia, Isidro; Orpella, Albert; Alcubilla González, Ramón; Villar, F.; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Roca i Cabarrocas, P. (Pere)

Crystal growth characterization of polycrystalline silicon films obtained by hot-wire chemical vapour deposition

Polo Trasancos, Ma. del Carmen; Peiró Martínez, Francisca; Cifre, J.; Bertomeu i Balagueró, Joan; Puigdollers i González, Joaquim; Andreu i Batallé, Jordi

Accesibility | Legal note | Cookies Policy

Coordination

Supporters