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Título:	Quantitative x-ray photoelectron spectroscopy study of Al/AlOx bilayers
Autor/a:	Batlle Gelabert, Xavier; Hattink, Bart Jan; Labarta, Amílcar; Åkerman, Johan J.; Escudero, Roberto; Schuller, Ivan K.
Otros autores:	Universitat de Barcelona
Abstract:	An x-ray photoelectron spectroscopy (XPS) analysis of Nb/Al wedge bilayers, oxidized by both plasma and natural oxidation, is reported. The main goal is to show that the oxidation state¿i.e., O:(oxidize)Al ratio¿, structure and thickness of the surface oxide layer, as well as the thickness of the metallic Al leftover, as functions of the oxidation procedure, can be quantitatively evaluated from the XPS spectra. This is relevant to the detailed characterization of the insulating barriers in (magnetic) tunnel junctions
Materia(s):	-Espectroscòpia de raigs X -Fotoelectrons -Espectroscòpia d'electrons -Materials magnètics -Photoelectrons -Electron spectroscopy -Magnetic materials
Derechos:	X-ray spectroscopy (c) American Institute of Physics, 2002
Tipo de documento:	Artículo Artículo - Versión publicada
Editor:	American Institute of Physics
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