Use of information on the manufacture of samples for the optical characterization of multilayers through a global optimization

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dc.contributor	Universitat de Barcelona
dc.contributor.author	Sancho i Parramon, Jordi
dc.contributor.author	Ferré Borrull, Josep
dc.contributor.author	Bosch i Puig, Salvador
dc.contributor.author	Ferrara, Maria Christina
dc.date	2012-04-20T12:10:15Z
dc.date	2012-04-20T12:10:15Z
dc.date	2003
dc.identifier.citation	0003-6935
dc.identifier.citation	505505
dc.identifier.uri	http://hdl.handle.net/2445/24296
dc.format	5 p.
dc.format	application/pdf
dc.language.iso	eng
dc.publisher	Optical Society of America
dc.relation	Reproducció del document publicat a: http://dx.doi.org/10.1364/AO.42.001325
dc.relation	Applied Optics, 2004, vol. 42, núm. 7, p. 1325-1329
dc.relation	http://dx.doi.org/10.1364/AO.42.001325
dc.rights	(c) Optical Society of America, 2003
dc.rights	info:eu-repo/semantics/openAccess
dc.subject	Òptica electrònica
dc.subject	Electron optics
dc.title	Use of information on the manufacture of samples for the optical characterization of multilayers through a global optimization
dc.type	info:eu-repo/semantics/article
dc.type	info:eu-repo/semantics/publishedVersion
dc.description.abstract	We present a procedure for the optical characterization of thin-film stacks from spectrophotometric data. The procedure overcomes the intrinsic limitations arising in the numerical determination of many parameters from reflectance or transmittance spectra measurements. The key point is to use all the information available from the manufacturing process in a single global optimization process. The method is illustrated by a case study of solgel applications.

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