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Title:	Quantitative x-ray photoelectron spectroscopy study of Al/AlOx bilayers
Author:	Batlle Gelabert, Xavier; Hattink, Bart Jan; Labarta, Amílcar; Åkerman, Johan J.; Escudero, Roberto; Schuller, Ivan K.
Other authors:	Universitat de Barcelona
Abstract:	An x-ray photoelectron spectroscopy (XPS) analysis of Nb/Al wedge bilayers, oxidized by both plasma and natural oxidation, is reported. The main goal is to show that the oxidation state¿i.e., O:(oxidize)Al ratio¿, structure and thickness of the surface oxide layer, as well as the thickness of the metallic Al leftover, as functions of the oxidation procedure, can be quantitatively evaluated from the XPS spectra. This is relevant to the detailed characterization of the insulating barriers in (magnetic) tunnel junctions
Subject(s):	-Espectroscòpia de raigs X -Fotoelectrons -Espectroscòpia d'electrons -Materials magnètics -Photoelectrons -Electron spectroscopy -Magnetic materials
Rights:	X-ray spectroscopy (c) American Institute of Physics, 2002
Document type:	Article Article - Published version
Published by:	American Institute of Physics
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