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Título:	Development of laser-fired contacts for amorphous silicon layers obtained by Hot-Wire CVD
Autor/a:	Muñoz Ramos, David; Voz Sánchez, Cristóbal; Blanque, S.; Ibarz, D.; Bertomeu i Balagueró, Joan; Alcubilla González, Ramón
Otros autores:	Universitat de Barcelona
Abstract:	In this work we study aluminium laser-fired contacts for intrinsic amorphous silicon layers deposited by Hot-Wire CVD. This structure could be used as an alternative low temperature back contact for rear passivated heterojunction solar cells. An infrared Nd:YAG laser (1064 nm) has been used to locally fire the aluminium through the thin amorphous silicon layers. Under optimized laser firing parameters, very low specific contact resistances (ρc ∼ 10 mΩ cm2) have been obtained on 2.8 Ω cm p-type c-Si wafers. This investigation focuses on maintaining the passivation quality of the interface without an excessive increase in the series resistance of the device.
Materia(s):	-Deposició química en fase vapor -Alumini -Cèl·lules solars -Làsers -Corrosió i anticorrosius -Semiconductors -Chemical vapor deposition -Aluminum -Solar cells -Lasers -Corrosion and anti-corrosives -Semiconductors
Derechos:	(c) Elsevier B.V., 2009
Tipo de documento:	Artículo Artículo - Versión aceptada
Editor:	Elsevier B.V.
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