Title:
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Molecular hydrogen diffusion in nanostructured amorphous silicon thin films
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Author:
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Kail, Fatiha; Farjas Silva, Jordi; Roura Grabulosa, Pere
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Abstract:
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We study hydrogen stability and its evolution during thermal annealing in nanostructured amorphous silicon thin films. From the simultaneous measurement of heat and hydrogen desorption, we obtain the experimental evidence of molecular diffusion in these materials. In addition, we introduce a simple diffusion model which shows good agreement with the experimental data |
Publication date:
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2013-11-12 |
Subject(s):
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-Hidrogenació -Hydrogenation -Silici -Silicon -Materials nanoestructurals -Nanostructure materials -Thin films -Capes fines |
Rights:
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Tots els drets reservats |
Document type:
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Article Article - Published version |
Published by:
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American Physical Society
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