Modelling and parameter fitting of the dosage of hydrogen peroxide in a photo-fenton process

Otros/as autores/as

Universitat Politècnica de Catalunya. Doctorat en Enginyeria de Processos Químics

Universitat Politècnica de Catalunya. Departament d'Enginyeria Química

Universitat Politècnica de Catalunya. ENCORE - Energy Catalysis Process Reaction Engineering

Fecha de publicación

2022

Resumen

This study addresses the modelling of the photo-Fenton processes, sensitivity analysis, and parameter fitting, focusing on the supply of hydrogen peroxide (H2O2) and aiming at the future exploitation in model-based optimization. A flexible H2O2 inlet flow (fed-batch) reported in the literature (Audino et al. 2019) was adopted and computational experiments were performed to examine the behaviour of the model and to investigate the opportunities for reducing its complexity. The fitting of the kinetic and stoichiometric parameters was first undertaken using simulated data and focusing on the experimentally available information: H2O2, Total Organic Carbon (TOC), and dissolved oxygen (O2). Hence, sensitivity analysis was conducted to assess the influence of the parameters of the model and the exclusion of those that do not contribute to explaining the process. Finally, the modified model was shown to fit to experimental data. These results provide valuable insight into the planning of the subsequent experimental phase of this research aimed at providing a reliable model of the flexible dosage of H2O2 in photo-Fenton processes.


Peer Reviewed


Postprint (published version)

Tipo de documento

Conference lecture

Lengua

Inglés

Documentos relacionados

https://www.elsevier.com/books/32nd-european-symposium-on-computer-aided-process-engineering/montastruc/978-0-323-95879-0

info:eu-repo/grantAgreement/AEI/Plan Estatal de Investigación Científica y Técnica y de Innovación 2017-2020/PID2020-116051RB-I00/ES/IMPLANTACION DE LA ECONOMIA CIRCULAR EN LA INDUSTRIA DE PROCESO (CEPI): METODOS Y HERRAMIENTAS PARA LA INTEGRACION CIRCULAR DE SISTEMAS/

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