2015-01-27T08:23:12Z
2015-01-27T08:23:12Z
2015-01-30
2015-01-27T08:23:12Z
The degradation of the catalytic filaments is the main factor limiting the industrial implementation of the hot wire chemical vapor deposition (HWCVD) technique. Up to now, no solution has been found to protect the catalytic filaments used in HWCVD without compromising their catalytic activity. Probably, the definitive solution relies on the automatic replacement of the catalytic filaments. In this work, the results of the validation tests of a new apparatus for the automatic replacement of the catalytic filaments are reported. The functionalities of the different parts have been validated using a 0.2 mm diameter tungsten filament under uc-Si:H deposition conditions.
Article
Accepted version
English
Deposició química en fase vapor; Silici; Catàlisi; Pel·lícules fines; Chemical vapor deposition; Silicon; Catalysis; Thin films
Elsevier
Versió postprint del document publicat a: http://dx.doi.org/10.1016/j.tsf.2014.10.010
Thin Solid Films, 2015, vol. 575, p. 30-33
http://dx.doi.org/10.1016/j.tsf.2014.10.010
(c) Elsevier, 2015