dc.contributor.author
Nos Aguilà, Oriol
dc.contributor.author
Frigeri, Paolo Antonio
dc.contributor.author
Bertomeu i Balagueró, Joan
dc.date.issued
2015-01-27T08:23:12Z
dc.date.issued
2015-01-27T08:23:12Z
dc.date.issued
2015-01-30
dc.date.issued
2015-01-27T08:23:12Z
dc.identifier
https://hdl.handle.net/2445/61845
dc.description.abstract
The degradation of the catalytic filaments is the main factor limiting the industrial implementation of the hot wire chemical vapor deposition (HWCVD) technique. Up to now, no solution has been found to protect the catalytic filaments used in HWCVD without compromising their catalytic activity. Probably, the definitive solution relies on the automatic replacement of the catalytic filaments. In this work, the results of the validation tests of a new apparatus for the automatic replacement of the catalytic filaments are reported. The functionalities of the different parts have been validated using a 0.2 mm diameter tungsten filament under uc-Si:H deposition conditions.
dc.format
application/pdf
dc.relation
Versió postprint del document publicat a: http://dx.doi.org/10.1016/j.tsf.2014.10.010
dc.relation
Thin Solid Films, 2015, vol. 575, p. 30-33
dc.relation
http://dx.doi.org/10.1016/j.tsf.2014.10.010
dc.rights
(c) Elsevier, 2015
dc.rights
info:eu-repo/semantics/openAccess
dc.source
Articles publicats en revistes (Física Aplicada)
dc.subject
Deposició química en fase vapor
dc.subject
Pel·lícules fines
dc.subject
Chemical vapor deposition
dc.title
Technological solution for the automatic replacement of the catalytic filaments in HWCVD
dc.type
info:eu-repo/semantics/article
dc.type
info:eu-repo/semantics/acceptedVersion