Non-homogeneuos conduction of conductive filaments in Ni/HfO2/Si resistive switching structures observed with CAFM

Author

Claramunt, Sergi

Wu, Qian

Maestro Izquierdo, Marcos

Porti i Pujal, Marc

Bargallo Gonzalez, Mireia

Martin Martinez, Javier

Campabadal, Francesca

Nafría i Maqueda, Montserrat

Publication date

2015

Abstract

Altres ajuts: ERDF/TEC2011-2792-C02-02


Conductive filaments (CFs) in Ni/HfO₂/Si resistive switching structures are analysed at the nanoscale by means of Conductive Atomic Force Microscopy (CAFM). Differences in the CF conductivity are measured depending on the resistive state of the device. Moreover, for both resistance states, non-homogeneous conduction across the CF area is observed, in agreement with a tree-shaped CF.

Document Type

Article

Language

English

Subjects and keywords

Resistive switching; CAFM; Metal-insulator-semiconductor (MIS)

Publisher

 

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Rights

open access

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