Plasma parameters of pulsed-dc discharges in methane used to deposit diamondlike carbon films

Publication date

2012-05-07T06:44:53Z

2012-05-07T06:44:53Z

2009-08-05

Abstract

Here we approximate the plasma kinetics responsible for diamondlike carbon (DLC) depositions that result from pulsed-dc discharges. The DLC films were deposited at room temperature by plasma-enhanced chemical vapor deposition (PECVD) in a methane (CH4) atmosphere at 10 Pa. We compared the plasma characteristics of asymmetric bipolar pulsed-dc discharges at 100 kHz to those produced by a radio frequency (rf) source. The electrical discharges were monitored by a computer-controlled Langmuir probe operating in time-resolved mode. The acquisition system provided the intensity-voltage (I-V) characteristics with a time resolution of 1 μs. This facilitated the discussion of the variation in plasma parameters within a pulse cycle as a function of the pulse waveform and the peak voltage. The electron distribution was clearly divided into high- and low-energy Maxwellian populations of electrons (a bi-Maxwellian population) at the beginning of the negative voltage region of the pulse. We ascribe this to intense stoc...

Document Type

Article


Published version

Language

English

Publisher

American Institute of Physics

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Reproducció del document publicat a: http://dx.doi.org/10.1063/1.3183945

Journal of Applied Physics, 2009, vol. 106, núm. 3, p. 033302

http://dx.doi.org/10.1063/1.3183945

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(c) American Institute of Physics, 2009

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