Plasma parameters of pulsed-dc discharges in methane used to deposit diamondlike carbon films

Fecha de publicación

2012-05-07T06:44:53Z

2012-05-07T06:44:53Z

2009-08-05

Resumen

Here we approximate the plasma kinetics responsible for diamondlike carbon (DLC) depositions that result from pulsed-dc discharges. The DLC films were deposited at room temperature by plasma-enhanced chemical vapor deposition (PECVD) in a methane (CH4) atmosphere at 10 Pa. We compared the plasma characteristics of asymmetric bipolar pulsed-dc discharges at 100 kHz to those produced by a radio frequency (rf) source. The electrical discharges were monitored by a computer-controlled Langmuir probe operating in time-resolved mode. The acquisition system provided the intensity-voltage (I-V) characteristics with a time resolution of 1 μs. This facilitated the discussion of the variation in plasma parameters within a pulse cycle as a function of the pulse waveform and the peak voltage. The electron distribution was clearly divided into high- and low-energy Maxwellian populations of electrons (a bi-Maxwellian population) at the beginning of the negative voltage region of the pulse. We ascribe this to intense stoc...

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American Institute of Physics

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Reproducció del document publicat a: http://dx.doi.org/10.1063/1.3183945

Journal of Applied Physics, 2009, vol. 106, núm. 3, p. 033302

http://dx.doi.org/10.1063/1.3183945

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(c) American Institute of Physics, 2009

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